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MOSFET parameters

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lightbulbAbout this topic
MOSFET parameters refer to the key electrical characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors, including threshold voltage, transconductance, drain-source current, and output conductance. These parameters are essential for analyzing and designing circuits that utilize MOSFETs in various applications, influencing their performance, efficiency, and operational stability.
lightbulbAbout this topic
MOSFET parameters refer to the key electrical characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors, including threshold voltage, transconductance, drain-source current, and output conductance. These parameters are essential for analyzing and designing circuits that utilize MOSFETs in various applications, influencing their performance, efficiency, and operational stability.

Key research themes

1. How do gate and channel engineering techniques mitigate short-channel effects and enhance performance in multigate MOSFETs?

This research theme focuses on advanced structural modifications such as gate engineering (using dual or tri-material gates) and channel engineering (graded/asymmetric doping) in multigate MOSFET architectures to reduce short-channel effects (SCEs), suppress leakage and hot-carrier effects (HCE), and improve analog/RF and DC characteristics. These techniques aim to optimize the electrostatics and carrier transport by introducing potential steps or doping asymmetry in the channel, thereby enhancing device scalability and linearity for nanoscale transistor applications.

Key finding: The review aggregates multiple studies demonstrating that gate engineering techniques such as dual-material and tri-material gates produce step-like potential profiles along the channel which effectively reduce subthreshold... Read more
Key finding: Detailed TCAD simulations reveal that integrating a graded channel architecture (lateral asymmetric doping) in junctionless surrounded gate MOSFETs significantly enhances linearity figure-of-merits (e.g., higher-order... Read more
Key finding: This complementary work corroborates that graded channel doping profiles in junctionless surrounded gate MOSFETs effectively reduce short-channel effects and enhance threshold voltage stability, leading to improved analog/RF... Read more

2. What are the challenges and methods for accurate extraction and modeling of MOSFET intrinsic parameters, including source/drain series resistances and parasitic capacitances, for device and circuit simulations?

Accurate device parameter extraction and modeling is critical for reliable MOSFET performance prediction and circuit design, especially with nanoscale devices where parasitic resistances and capacitances significantly affect switching speed and analog characteristics. This theme covers experimental and theoretical approaches to separate intrinsic device characteristics from extrinsic parasitic effects. It includes development and evaluation of extraction techniques for individual source/drain resistances, modeling the impact of parasitic junction and gate capacitances, and assessing high-frequency behavior through small-signal equivalent circuits.

Key finding: This paper scrutinizes various methodologies to extract separate source (Rs) and drain (Rd) series resistances, which are crucial for intrinsic device parameter extraction and accurate circuit simulation. It explains the... Read more
Key finding: The paper systematically analyzes MOSFET parasitic capacitances including gate-to-source (Cgs), gate-to-drain (Cgd), gate-to-bulk (Cgb), and junction capacitances, examining how physical device parameters (channel length,... Read more
Key finding: This research evaluates mainstream MOSFET models (EKV, SPICE Level 3, Bsim3v3, Philips MOS Model 9) focusing on their accuracy for AC and RF performance simulations. Using S-parameter fitting and capacitance measurements on... Read more
Key finding: The paper presents experimental measurement of MOSFET output and transfer I-V characteristics alongside simulations using MATLAB/Simulink and LTSpice. It demonstrates that realistic device parameter extraction such as... Read more

3. How do MOSFET device scaling and alternative materials like III-V semiconductors and 2D materials influence electrical parameters and technology scalability?

This theme explores the impact of dimensional downscaling and alternative channel materials (e.g., III-V compounds, MoS2, and silicon superjunction structures) on MOSFET device parameters such as threshold voltage, breakdown voltage, on-resistance, and RF performance metrics. It addresses the physical and technological challenges for future technology nodes, including material surface properties, Fermi level pinning, and tradeoffs between conduction and switching losses in power MOSFETs. The research also covers how novel device architectures and doping engineering can enable improved device scalability and efficiency.

Key finding: This chapter provides a critical overview of the historical and scientific challenges impeding the development of III-V compound semiconductor MOSFETs compared to dominant Si MOSFET technology. The main obstacle identified is... Read more
Key finding: This work systematically models 4-layer MoS2 MOSFET performance scaling down to sub-10 nm channel lengths using classical drift-diffusion and quantum NEGF approaches. It shows that classical models are valid for channel... Read more
Key finding: The paper reports a silicon power MOSFET with exceptionally low specific on-resistance (24 mΩ·cm²) and gate charge product (Ron'Qgd) at a high breakdown voltage of 680 V, achieving record-breaking figures well below silicon... Read more
Key finding: This work presents novel SOI MESFET designs using tri-material gate (TMG) and tri-gate (TG) architectures to enhance channel mobility, suppress short-channel effects (SCEs), and improve scalability down to 100 nm gate... Read more

All papers in MOSFET parameters

Impact of MOSFET parameters on its parasitic capacitances NEBI CAKA, MILAIM ZABELI, MYZAFERE LIMANI, QAMIL KABASHI Faculty of Electrical and Computer Engineering University of Prishtina 10110 Prishtina, Fakulteti Teknik, Kodra e Diellit,... more
As short-channel effects (SCEs) are a major issue in the nanoscale regime, investigation of the subthreshold behaviour of nanometer-scale devices is critical. Here, we have developed an analytical model for a cylindrical gate junctionless... more
Carrier distributions in cross-section of operated SiC power MOSFET were measured using super-higher-order scanning nonlinear dielectric microscopy. Two measurements were carried out; depletion layer distribution analysis for "on"/"off"... more
A two-dimensional (2-D) analytical model for dual-material double gate (DMDG) Silicon-on-Nothing (SON) MOSFETs is developed to study the effect of variation of both the surface potential and threshold voltage on short channel effects... more
We report on the effects of temperature and biasing voltages on the parasitic resistance (Rp) and channel length reduction (AL) parameters in short-channel lightlydoped drain (LDD) NMOS transistors. These two parameters and their... more
The objective of this paper is to show the influence of the parameters that characterize the NMOS transistors on the behavior of NMOS inverters in static operation mode, as well as set directive that should be followed during the design... more
The aim of this paper is to show the influence of the threshold voltage and transconductance parameters that characterize the NMOS transistors on the behavior of NMOS inverters in static and switching conditions of operation, as well as... more
The pseudo-NMOS logic can be used in special applications to perform special logic function. The pseudo-NMOS logic is based on designing pseudo-NMOS inverter which functions as a digital switch. During the design phase of pseudo-NMOS... more
Impact of MOSFET parameters on its parasitic capacitances NEBI CAKA, MILAIM ZABELI, MYZAFERE LIMANI, QAMIL KABASHI Faculty of Electrical and Computer Engineering University of Prishtina 10110 Prishtina, Fakulteti Teknik, Kodra e Diellit,... more
This present article interprets the analytical models of central channel potential, the threshold voltage, and subthreshold current for Graded-Doped Junctionless-Gate-All-Around (GD-JL-GAA) MOSFETs. The parabolic approximation equation... more
The objective of this paper is to show the influence of the parameters that characterize the NMOS transistors on the behavior of NMOS inverters in static operation mode, as well as set directive that should be followed during the design... more
The aim of this paper is to show the influence of the threshold voltage and transconductance parameters that characterize the NMOS transistors on the behavior of NMOS inverters in static and switching conditions of operation, as well as... more
The aim of this paper is to research the impact of physical parameters which characterize the MOSFET transistors structure on the threshold voltage values and its influence on critical voltage values which characterize digital circuits... more
Impact of MOSFET parameters on its parasitic capacitances NEBI CAKA, MILAIM ZABELI, MYZAFERE LIMANI, QAMIL KABASHI Faculty of Electrical and Computer Engineering University of Prishtina 10110 Prishtina, Fakulteti Teknik, Kodra e Diellit,... more
Abstract: The aim of this paper is to calculate the MOSFET parasitic capacitances, and then based on the results obtained we can further see the impact of MOSFET physical parameters on these parasitic capacitances. These capacitances have... more
The objective of this paper is to research the impact of electrical and physical parameters that characterize the complementary MOSFET transistors (NMOS and PMOS transistors) in the CMOS inverter for static mode of operation. In addition... more
The objective of this paper is to research the impact of electrical and physical parameters that characterize the complementary MOSFET transistors (NMOS and PMOS transistors) in the CMOS inverter for static mode of operation. In addition... more
The aim of this paper is to research the impact of physical parameters which characterize the MOSFET transistors structure on the threshold voltage value. The MOSFET threshold voltage value will have influence in behaviour of electronic... more
Impact of MOSFET parameters on its parasitic capacitances NEBI CAKA, MILAIM ZABELI, MYZAFERE LIMANI, QAMIL KABASHI Faculty of Electrical and Computer Engineering University of Prishtina 10110 Prishtina, Fakulteti Teknik, Kodra e Diellit,... more
The aim of this paper is to research the impact of physical parameters which characterize the MOSFET transistors structure on the threshold voltage values and its influence on critical voltage values which characterize digital circuits... more
The aim of this paper is to research the impact of physical parameters which characterize the MOSFET transistors structure on the threshold voltage value. It is also analysed the role of substrate (the body effect) on the threshold... more
The application of wireless technology is increasingly influencing the deployment of sensor networks at low cost and maintainance in all walks of life. Poor channel conditions, severe power constraints, fading, interference and the low... more
The application of wireless technology is increasingly influencing the deployment of sensor networks at low cost and maintainance in all walks of life. Poor channel conditions, severe power constraints, fading, interference and the low... more
With devices entering the nanometer scale process-induced variations, intrinsic variations and reliability issues impose new challenges for the electronic design automation industry. Design automation tools must keep the pace of... more
The objective of this paper is to research the impact of electrical and physical parameters that characterize the complementary MOSFET transistors (NMOS and PMOS transistors) in the CMOS inverter for static mode of operation. In addition... more
The aim of this paper is to research the impact of physical parameters which characterize the MOSFET transistors structure on the threshold voltage value. It is also analysed the role of substrate (the body effect) on the threshold... more
The aim of this paper is to calculate the MOSFET parasitic capacitances, and then based on the results obtained we can further see the impact of MOSFET physical parameters on these parasitic capacitances. These capacitances have a direct... more
The aim of this paper is to research the impact of physical parameters which characterize the MOSFET transistors structure on the threshold voltage value. The MOSFET threshold voltage value will have influence in behaviour of electronic... more
The aim of this paper is to research the impact of physical parameters which characterize the MOSFET transistors structure on the threshold voltage values and its influence on critical voltage values which characterize digital circuits... more
The pseudo-NMOS logic can be used in special applications to perform special logic function. The pseudo- NMOS logic is based on designing pseudo-NMOS inverter which functions as a digital switch. During the design phase of pseudo-NMOS... more
The objective of this paper is to show the influence of the parameters that characterize the NMOS transistors on the behavior of NMOS inverters in static operation mode, as well as set directive that should be followed during the design... more
The objective of this paper is to research the impact of electrical and physical parameters that characterize the complementary MOSFET transistors (NMOS and PMOS transistors) in the CMOS inverter for static mode of operation. In addition... more
Advanced development of technological processes influenced a wide use of MOSFET transistors in design of integrated digital circuits with high density packages (VLSI). However, in MOSFET transistors parasitic capacitances are present,... more
The objective of this paper is to show the influence of the parameters that characterize the NMOS transistors on the behavior of NMOS inverters in static operation mode, as well as set directive that should be followed during the design... more
The aim of this paper is to show the influence of the threshold voltage and transconductance parameters that characterize the NMOS transistors on the behavior of NMOS inverters in static and switching conditions of operation, as well as... more
During the design phase of different logic gates based on MOS technologies, it is necessary to take into consideration many parameters which characterise MOS transistors. One of the parameters which characterizes all types of MOSFET... more
The pseudo-NMOS logic can be used in special applications to perform special logic function. The pseudo-NMOS logic is based on designing pseudo-NMOS inverter which functions as a digital switch. During the design phase of pseudo-NMOS... more
The aim of this paper is to research the impact of physical parameters which characterize the MOSFET transistors structure on the threshold voltage value. The MOSFET threshold voltage value will have influence in behaviour of electronic... more
The aim of this paper is to research the impact of physical parameters which characterize the MOSFET transistors structure on the threshold voltage value. It is also analysed the role of substrate (the body effect) on the threshold... more
The objective of this paper is to show the influence of the parameters that characterize the NMOS transistors on the behavior of NMOS inverters in static operation mode, as well as set directive that should be followed during the design... more
The aim of this paper is to research the impact of physical parameters which characterize the MOSFET transistors structure on the threshold voltage value. It is also analysed the role of substrate (the body effect) on the threshold... more
The aim of this paper is to research the impact of physical parameters which characterize the MOSFET transistors structure on the threshold voltage value. The MOSFET threshold voltage value will have influence in behaviour of electronic... more
The pseudo-NMOS logic can be used in special applications to perform special logic function. The pseudo-NMOS logic is based on designing pseudo-NMOS inverter which functions as a digital switch. During the design phase of pseudo-NMOS... more
During the design phase of different logic gates based on MOS technologies, it is necessary to take into consideration many parameters which characterise MOS transistors. One of the parameters which characterizes all types of MOSFET... more
The objective of this paper is to research the impact of electrical and physical parameters that characterize the complementary MOSFET transistors (NMOS and PMOS transistors) in the CMOS inverter for static mode of operation. In addition... more
The objective of this paper is to show the influence of the parameters that characterize the NMOS transistors on the behavior of NMOS inverters in static operation mode, as well as set directive that should be followed during the design... more
During the design phase of different logic gates based on MOS technologies, it is necessary to take into consideration many parameters which characterise MOS transistors. One of the parameters which characterizes all types of MOSFET... more
The pseudo-NMOS logic can be used in special applications to perform special logic function. The pseudo-NMOS logic is based on designing pseudo-NMOS inverter which functions as a digital switch. During the design phase of pseudo-NMOS... more
The aim of this paper is to research the impact of physical parameters which characterize the MOSFET transistors structure on the threshold voltage value. The MOSFET threshold voltage value will have influence in behaviour of electronic... more
The aim of this paper is to research the impact of physical parameters which characterize the MOSFET transistors structure on the threshold voltage values and its influence on critical voltage values which characterize digital circuits... more
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