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Outline

Reliability enhancement via Sleep Transistors

2011, 2011 12th Latin American Test Workshop (LATW)

https://doi.org/10.1109/LATW.2011.5985901

Abstract

CMOS is still the predominating technology for digital designs with no identifiable concurrence in the near future. Driving forces of this leadership are the high miniaturization capability and the reliability of CMOS. The latter, though, is decreasing with an alarming pace against the background of technologies with sizes at the nanoscale. The consequence is a rising demand of solutions to improve lifetime reliability and yield of today's integrated systems. Thereby, a common solution is the redundant implementation of components. However, redundancy collides with another major issue of integrated circuits -power dissipation. The main contribution of this work is an approach that increases the lifetime reliability at only low delay and power penalty. Therefore, the well-known standbyleakage reduction technique "Sleep Transistors" is combined with the idea of redundancy. Additional, we propose an extended flow for reliability verification on transistor level. Simulation results indicate that the new approach can increase the lifetime reliability by more than factor 2 compared to initial designs.

References (27)

  1. J. Srinivasan, S. Adve, P. Bose, and J. Rivers, "The impact of technology scaling on lifetime reliability", Proc. DSN'04 (IEEE), 2004.
  2. P. Bernardi, L. M. V. Bolzani, M. Rebaudengo, M. S. Reorda, F. L. Vargas, and M. Violante, "A new hybrid fault detection technique for Systems-on-a-Chip", IEEE Trans. Comput. 55, 2, 185-198, 2006.
  3. R. Datta, A. A Jacob, A. U. Diril, A, Chatterjee and K. Nowka, "Adaptive design for performance-optimized robustness" Proc. DFT'06, pp. 3-11, 2006.
  4. S. Mitra, N. Seifert, M. Zhang, Q. Shi, and K. S. Kim, "Robust System Design with Built-In Soft-Error Resilience," Computer, pp. 43-52, February, 2005.
  5. T. Inukai, T. Hiramoto, and T. Sakurai, "Variable threshold CMOS (VTCMOS) in series connected circuits" Proc. ISLPED'01, 2001.
  6. J. Tschanz et al., "Adaptive body bias for reducing impacts of die-to-die and within-die parameter variations on microprocessor frequency and leakage", IEEE J. of Solid-States Circuits (JSSC), vol. 37, 2002.
  7. I. Koren and C. Krisha, Fault-tolerant systems, Morgan Kaufmann, 2007.
  8. J. Srinivasan, S. V. Adve, P. Bose, J. Rivers, and C.-K. Hu, "RAMP: A Model for Reliability Aware Microprocessor Design", IBM Research Report, RC23048, 2003.
  9. J.R.Black, "A brief survey of electromigration and some recent results", In IEEE Transactions on Electron Devices, 1969.
  10. "Failure Mechanisms and Models for Semiconductor Devices", JEDEC Publication JEP122-A, Jedec Solid State Technolgy Association, 2002.
  11. J. Stathis, "Reliability limits for the gate insulator in cmos technology", IBM Journal of Research & Develop, 2002.
  12. D. Crook, "Method of determining reliability screens for time dependent reliability breakdown", IRPS, 1979.
  13. E. Y. Wu et al., "Interplay of voltage and temperature acceleration of oxide breakdown for ultra-thin gate dioxides", Solid-state Electronics Journal, 2002.
  14. T. Grasser and B. Kaczer, "Evidence that two tightly coupled mechanisms are responsible for negative bias instability in oxynitride MOSFETs", IEEE Trans. Ele.. Devices, 2009, 56, (5), pp. 1056-1062.
  15. E. Maricau and G. Gielen, "NBTI model for analogue IC reliability simulation", Electronics Letters, 2010, 46 (19).
  16. M. Powell, S.-H Yang, B. Falsafi, K. Roy, and T. N. Vijaykumar, "Gated-Vdd: A circuit technique to reduce leakage in deep-submicron cache memories", Proc. ISLPED'00, 2000, pp. 90-95.
  17. A. Ramalingam, B. Zhang, A. Davgan, and D. Pan, "Sleep transistor sizing using timing criticality and temporal currents", Proc. ASP-DAC, 2005.
  18. K. Shi, and D. Howard, "Challenges in sleep transistor design and implementation in low-power designs", Proc. DAC'06, 2006, pp.113.
  19. "Designing for power -intel leadership in power efficient silicon and system design," 2004, www.intel.com/technology.
  20. C. Cornelius, et al. "Encountering gate oxide breakdown with shadow transistors to increase reliability", Proc. SBCCI'08, 2008, pp. 111-116.
  21. M. Renovell, J. Gallière, F. Azaïs and Y. Bertrand, "Modeling the random parameters effects in a non-split model of gate oxide short", Journal Electronic Testing, vol. 19, no. 4, 2003.
  22. Rakesh Vattikonda, Wenping Wang, and Yu Cao. 2006. Modeling and minimization of PMOS NBTI effect for robust nanometer design. In Proceedings of the 43rd annual Design Automation Conference (DAC '06). ACM, New York, NY, USA, 1047-1052.
  23. H. Li and Y. Chen, "An overview of non-volatile memory technology and the implication for tools and architectures," in 2009 Design, Automation & Test in Europe Conference & Exhibition, pp. 731-736.
  24. M. Kole, "Circuit realiability simulation based on Verilog-A," Proc. BMAS'07, 2007, pp.58-63.
  25. M. Hansen, H. Yalcin, and J. P. Hayes, "Unveiling the ISCAS-85 Benchmarks: A Case Study in Reverse Engineering", IEEE D&T, vol. 16, no. 3, pp. 72-80, July-Sept. 1999.
  26. W. Zhao, and Y. Cao, "New generation of Predictive Technology Model for sub-45nm early design exploration," IEEE Transactions on Electron Devices, vol. 53, no. 11, pp. 2816-2823, November 2006.
  27. M. Renovell, J.M. Galliere, F. Azais, and Y. Bertrand, "Delay Testing of MOS Transistor with Gate Oxide Short," Proc. ATS'03, 2003, pp.168.