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Ion Implantation

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Ion implantation is a materials engineering process used to introduce ions into a solid substrate to modify its physical and chemical properties. This technique is commonly employed in semiconductor fabrication to alter electrical characteristics, enhance material hardness, or improve corrosion resistance by embedding specific ions at controlled depths.
lightbulbAbout this topic
Ion implantation is a materials engineering process used to introduce ions into a solid substrate to modify its physical and chemical properties. This technique is commonly employed in semiconductor fabrication to alter electrical characteristics, enhance material hardness, or improve corrosion resistance by embedding specific ions at controlled depths.

Key research themes

1. How can ion implantation parameters be optimized to control dopant activation and distribution in semiconductor materials?

This research theme focuses on investigating the effects of ion implantation parameters—such as ion species, energy, fluence, temperature, and implantation method—on dopant activation efficiency, electrical and optical properties, and dopant distribution profiles in semiconductor materials. Optimizing these parameters enables precision in device fabrication, particularly for ultra-shallow junctions and single atom devices, contributing to advanced microelectronics and quantum technologies.

Key finding: Nitrogen ion implantation at 30 keV with a dose of 1×10^18 ions/cm^2 into copper oxide thin films modifies their microstructural, optical, and morphological properties effectively, enhancing both electrical conductivity and... Read more
Key finding: Sub-keV boron ion implantation using deceleration mode enables formation of ultrashallow junctions (<500 Å) with steep dopant profiles, crucial for device scaling beyond 65 nm; however, implantation energy contamination (ions... Read more
Key finding: Development of deterministic ion implantation strategies using ion beam induced charge detection enables implantation of single phosphorus donor atoms in silicon with high precision at energies around 14 keV; this precision... Read more
Key finding: Implanting polycarbonate polymers with 1 MeV metal ions (Cu+, Ag+, Au+) induces significant electrical conductivity enhancement (sheet resistance reduction by nearly 10 orders of magnitude) due to formation of metal... Read more
Key finding: Monte Carlo simulations coupled with secondary ion mass spectrometry reveal that during 100 keV Al ion implantation in 4H-SiC, a significant fraction of ions undergo channeling along low-index crystallographic directions... Read more

2. What are the effects of ion implantation on the surface morphology and functional properties of materials used in biological and nuclear applications?

This theme covers how ion implantation modifies surfaces of materials such as polymers, biological implant alloys, and nuclear fuel coatings, impacting biocompatibility, osseointegration, durability, and radiation damage simulation. It emphasizes experimental approaches to tailor material properties for medical implant integration and accelerated testing of nuclear fuel materials through controlled irradiation.

Key finding: Ion beam sputtering using electron bombardment ion thruster technology effectively modifies surface chemistry and texture of biomedical implant materials—including biocompatible metals, alloys, and polymers—at nanometer... Read more
Key finding: Atmospheric plasma-sprayed surface treatment on carbon-reinforced PEEK implants significantly improves osseointegration in vivo compared to untreated PEEK surfaces, evidenced by higher bone-to-implant contact percentages and... Read more
Key finding: Ion implantation simulating neutron irradiation (via controlled displacement per atom parameters) on surrogate TRISO nuclear fuel particles enables accelerated assessment of damage to buffer and pyrolytic carbon layers using... Read more
Key finding: In vitro irradiation of human osteoblasts and mesenchymal stem cells on titanium implant surfaces with clinically relevant doses (2-14 Gy) increases DNA damage, particularly in MSCs, enhanced by titanium backscatter effects,... Read more

3. How can advanced ion implantation and beam technologies enhance ion selection, implantation precision, and plasma interactions for semiconductor and materials processing?

This theme investigates innovative ion implantation apparatus designs, measurement techniques, and plasma-beam interaction characterizations that improve ion charge state breeding, implantation fluence accuracy, spatial resolution, and plasma composition control essential for next-generation semiconductor device fabrication and surface modification technologies.

Key finding: Reviewing the history and development of ion implantation technology, this work highlights the need for compact, user-friendly boron ion implanters especially for high purity germanium radiation sensor production, discussing... Read more
Key finding: By combining high-precision Faraday cup charge collection with Rutherford Backscattering Spectrometry (RBS) traceable to certified reference materials, the study demonstrates absolute implantation fluence measurement accuracy... Read more
Key finding: The BRIC charge state breeder employing an embedded RF quadrupole field within the ion drift chamber allows selective ion containment verified experimentally and supported by simulations, enhancing the efficiency of ion... Read more
Key finding: Integration of ion beams with piezoresistive scanning probes achieves implantation spot sizes dictated by the aperture on the cantilever tip, enabling nm-scale spatial alignment of single ion implantation verified by PMMA... Read more
Key finding: Experimental mass spectrometry shows that in beam plasmas generated by electron-beam evaporation under forevacuum conditions, ionization is dominated by beam electrons with metal or ceramic vapor ions greatly exceeding... Read more

All papers in Ion Implantation

We investigate terahertz time-domain spectroscopy (THz-TDS) as a non-destructive and non-contact technique for depth profiling of dopants in semiconductors. THz temporal waveforms transmitted through silicon-ion-implanted semi-insulating... more
One of the strategies which have been defended to reduce fouling during heat treatment in the dairy industry is to modify the surface properties of the stainless steel used in heat exchangers, in order to decrease its appetence for milk... more
Reducing fouling in heat exchangers during treatment of milk products is one of the great challenges in the dairy industry. One approach to mitigate fouling is to alter the surface characteristics of the heat exchangers making them less... more
Fouling of heat exchangers in dairy industries is still quite a severe problem both technically and economically. Altering the surface properties of the heating surfaces would be a way of solving this issue. Modified steel surfaces were... more
One of the strategies which have been defended to reduce fouling during heat treatment in the dairy industry is to modify the surface properties of the stainless steel used in heat exchangers, in order to decrease its appetence for milk... more
In order to reduce the fouling caused by milk during heat treatment, it is important to know more about the deposition process of calcium phosphate, one of the main components of milk fouling, on stainless steel surfaces. The fouling... more
Reducing fouling in heat exchangers during treatment of milk products is one of the great challenges in the dairy industry. One approach to mitigate fouling is to alter the surface characteristics of the heat exchangers making them less... more
The structural and morphological characteristics of visible-light-emitting porous Si layers produced by anodic and stain etching of single-crystal Si substrates are compared using transmission electron microscopy and atomic force... more
The paper concerns an important problem which is connected with the inclusion of some impurities in the deposited metal film. It was found that appearance of contaminants in the film is induced mainly by water vapor remnants inside the... more
We have conducted a study of the material and infrared-luminescence properties of Er-implanted GaN thin films as a function of annealing. The GaN films, grown by metal-organic chemical-vapor deposition, were coimplanted with Er and O... more
We have conducted a study of the material and infrared-luminescence properties of Er-implanted GaN thin films as a function of annealing. The GaN films, grown by metal-organic chemical-vapor deposition, were coimplanted with Er and O... more
HAL is a multi-disciplinary open access archive for the deposit and dissemination of scientific research documents, whether they are published or not. The documents may come from teaching and research institutions in France or abroad, or... more
The high quality of crystal growth and advanced fabrication technology of silicon carbide (SiC) in power electronics enables the control of optically active defects in SiC, such as silicon vacancies (V Si ). In this paper, V Si are... more
Europa's surface is chemically altered by radiolysis from energetic charged particle bombardment. It has been suggested that hydrated sulfiu-ic acid (H2SOpnH20) is a major surface species and is part of a radiolytic sulfur cycle, where a... more
In this paper an analytical approach for estimation of maximal continuance of manufacturing of integrated circuit elements by dopant diffusion and ion implantation has been introduced. We analyzed influence of parameters of considered... more
Silicon samples that have been ion implanted with boron at energies below 3 keV have been athermally annealed. The annealing process has been characterized using secondary ion mass spectrometry and infrared absorption spectroscopy. The... more
Silicon defect and nanocrystal related white and red electroluminescences (EL) of Si-rich SiO 2 based on metal-oxidesemiconductor (MOS) diode using transparent electrode contact are reported. The 500nm-thick Si-rich SiO 2 film on ntype Si... more
Results are presented that have been obtained while operating the graphite hollow cathode duoplasmatron ion source in dual mode under constant discharge current. This dual mode operation enabled us to obtain the mass and emission spectra... more
In this paper we report the observation of photothermal effect in PbTe p-n junction. The effect is expressed in photosignal generation due to illumination by 100 ns pulse CO2 laser with photon energy less than PbTe forbidden gap.
The plasma physics of dielectric barrier discharges (DBD) for carrying out ion implantation in insulators is investigated. A hollow cathode DBD excited by high-voltage pulses is suitable for ion bombardment of the surfaces of insulating... more
Dans la realisation de nouveaux composants innovants de la spintronique, de grands espoirs sont places sur les semi-conducteurs magnetiques dilues (DMS). L’enjeu technologique est de developper des materiaux ayant a la fois des proprietes... more
Semiconductors have large second-order nonlinearities, e.g. GaAs [d 14 ~170 pmV -1 at 2 µm] has a d 2 /n 3 figure-of-merit around 10 times larger than LiNbO 3 . GaAs has a mature fabrication technology with the potential for direct... more
For applications in energy harvesting, environmentally friendly cooling, and as power sources in remote or portable applications, it is desired to enhance the efficiency of thermoelectric materials. One strategy consists of reducing the... more
The origin of the formation of multishell fullerenes ͑carbon onions͒ produced by carbon ion-implantations performed at high-temperature into silver is discussed on the basis of high-resolution transmission electron microscopy... more
Applied Physics A m. kalitzova 1,u o.i. lebedev 2 g. zollo 3 k. gesheva 4 e. vlakhov 1 y. marinov 1 t. ivanova 4
The Standards Committee of the Society for Luminescence Microscopy and Spectroscopy (SLMS) circulated doped zircon crystals as a standard for comparison of cathodoluminescence (CL) emission spectra obtained at different laboratories.... more
We have achieved 1 . 6 m -c m resistivity using ion implantation that has little negative effect on MOS devices. Extremely low loss and cross coupling of 6.3 and -79 dB/cm (10pm gap) at 20GHz are measured with lpm Al, respectively, which... more
The process of ion implantation often involves vacancy generation and migration. The vacancy generation and migration near a monocrystalline silicon surface during three kinds of energetic Si35 cluster ion implantations were investigated... more
A study of structure and surface morphology together with magnetic properties of Mn-implanted rutile-type TiO2 single crystals is performed. Homogenous thin films of about 100 nm with different MnxTi1−xO2 (x=0.03; 0.05 and 0.07) chemical... more
The presence of radiation-induced defects and the high temperature of implantation are breeding grounds for helium (He) to accumulate and form He-induced defects (bubbles, blisters, craters, and cavities) in silicon carbide (SiC). In this... more
Structural Characterization of Germanium and Gold -Germanium Nanoclusters Embedded in Silica
Shallow subsurface layers of gold nanoclusters were formed in polymethylmethacrylate (PMMA) polymer by very low energy (49 eV) gold ion implantation. The ion implantation process was modeled by computer simulation and accurately predicted... more
PMMA (polymethylmethacrylate) was ion implanted with gold at very low energy and over a range of different doses using a filtered cathodic arc metal plasma system. A nanometer scale conducting layer was formed, fully buried below the... more
We have investigated the structure of disordered gold-polymer thin films using small angle x-ray scattering and compared the results with the predictions of a theoretical model based on two approaches—a structure form factor approach and... more
This study investigates the fretting wear behavior of diamond-like carbon (DLC) films deposited by plasma-based ion implantation (PBII) and filtered cathodic vacuum arc (FCVA) and that of diamond films deposited by plasma chemical vapor... more
In this paper negative temperature coefficient of the 6H-SiC diode breakdown voltage is considered. It is shown that the temperature dependence of the breakdown voltage value can be explained in terms of recharging of deep centers in the... more
4H-and 6H-SiC small samples were implanted by keV Al + ions at room temperature and annealed in an induction heating furnace, at the center of the susceptor, for different temperatures and times in the range 1600-1800°C and 5-60 min,... more
Intermediate band silicon solar cells have been fabricated by Titanium ion implantation and laser annealing. A two-layer heterogeneous system, formed by the implanted layer and by the unimplanted substrate is obtained. In this work we... more
The lunar meteorite Dhofar 1436 is dominated by solar wind type noble gases. Solar argon is equilibrated with “parentless” 40Ar commonly known as lunar orphan argon. Ar‐Ar isochron analyses determined the lunar trapped 40Ar/36Ar ratio to... more
Because of their high degree of structural order, high mechanical strength, and small diameter ( -1 pm), benzene-derived graphite fibers provide an excellent host material for a structural analysis of both the intercalation and... more
The goal of this NEUP-IRP project is to develop a fuel concept based on an advanced ceramic coating for Zr-alloy cladding. The coated cladding must exhibit demonstrably improved performance compared to conventional Zr-alloy clad in the... more
We measure the crossover from diffusive to ballistic transport as a function of frequency in dc contacted high-mobility two-dimensional electron gas structures in GaAs/ AlGaAs heterostructures at GHz frequencies. By systematically... more
We measure the crossover from diffusive to ballistic transport as a function of frequency in dc contacted high-mobility two-dimensional electron gas structures in GaAs/ AlGaAs heterostructures at GHz frequencies. By systematically... more
Bioinert metals are used for medical implants and in some industrial applications. This study was performed to detect and analyze peculiarities that appear in the temperature distributions during quasi-static tensile testing of bioinert... more
This is a PDF file of an article that has undergone enhancements after acceptance, such as the addition of a cover page and metadata, and formatting for readability, but it is not yet the definitive version of record. This version will... more
We studied the rearran gement of ion-implanted hydrogen in <100 > oriented n-type silicon wafers upon annealing and its effect on the crystal damage . The silicon samples were implanted with 42 keV protons to a dose of 2 x 1016 H /cm2 and... more
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