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Fig. 5. (a) Single-cycle voltammograms run between 0.0 V and — 0.3 V including a holding time at 0.0 V. (b) Plot of the Q,/Q, ratio vs. the uppet potential limit (Z,) obtained from the first cycle between E, and —0.3 V. (c) Single cycle voltammograms run between 0.1 V and —0.3 V including a holding time at 0.1 V. 0.5 mM FDS +0.5 M sulphuric acid. v= 0.05 V s~!. Temperature: 298 K.  eee eS eee eee Oe ee ee eee  To determine the influence of FDS, as compared to TU, on the electrodissolution of copper, voltam- mograms of copper in 0.5 M sulphuric acid + 0.5 mM FDS were run, covering the potential range — 0.30 < E <0.075 V, i.e. where FDS is formed from TU electro- oxidation (Fig. 4). In these runs the potential routine included a potential holding at EF, in the range — 0.100< F,<0.075 V for the time ct (Fig. 5a). The voltammetric scan from 0.025 V downward shows the appearance of peak II,, which is related to the electrore- duction of Cu(J) soluble species, the height of this peak increasing with t. Voltammograms also show that the positive to negative voltammetric charge ratio (Q,/Q,) depends on the upper potential limit, E, (Fig. 5b). These results indicate that the presence of FDS alone assists the formation of Cu(I) soluble species at these potentials. As £, is moved from — 0.10 to 0.075 V, the relative contribution of Cu(I) electrodissolution to the overall anodic process appears to be increased. Besides Q,/Q,, decreases almost linearly with E,, approaching 1  As shown by polarisation curves at 0 V,  even at the  lowest cry there is a considerable hindrance of the anodic reactions. Therefore, it was interesting to inves- tigate the lowest potential at which the coverage of the copper surface by TU could be detected. For this  purpose, voltammograms of thallium upd  covering the potential range where the alloyi  were run ing effect is  negligible [32—35]. The blank voltammograms (Fig. 6)  show the anodic and cathodic peaks of thal  jum upd in  the potential range — 0.65 to — 0.45 V. The anodic to  cathodic charge ratio is Q,/OQ,=1, and  involves a charge density of 0.35 mC cm~? a  reported [34].  he process as has been

Figure 5 (a) Single-cycle voltammograms run between 0.0 V and — 0.3 V including a holding time at 0.0 V. (b) Plot of the Q,/Q, ratio vs. the uppet potential limit (Z,) obtained from the first cycle between E, and —0.3 V. (c) Single cycle voltammograms run between 0.1 V and —0.3 V including a holding time at 0.1 V. 0.5 mM FDS +0.5 M sulphuric acid. v= 0.05 V s~!. Temperature: 298 K. eee eS eee eee Oe ee ee eee To determine the influence of FDS, as compared to TU, on the electrodissolution of copper, voltam- mograms of copper in 0.5 M sulphuric acid + 0.5 mM FDS were run, covering the potential range — 0.30 < E <0.075 V, i.e. where FDS is formed from TU electro- oxidation (Fig. 4). In these runs the potential routine included a potential holding at EF, in the range — 0.100< F,<0.075 V for the time ct (Fig. 5a). The voltammetric scan from 0.025 V downward shows the appearance of peak II,, which is related to the electrore- duction of Cu(J) soluble species, the height of this peak increasing with t. Voltammograms also show that the positive to negative voltammetric charge ratio (Q,/Q,) depends on the upper potential limit, E, (Fig. 5b). These results indicate that the presence of FDS alone assists the formation of Cu(I) soluble species at these potentials. As £, is moved from — 0.10 to 0.075 V, the relative contribution of Cu(I) electrodissolution to the overall anodic process appears to be increased. Besides Q,/Q,, decreases almost linearly with E,, approaching 1 As shown by polarisation curves at 0 V, even at the lowest cry there is a considerable hindrance of the anodic reactions. Therefore, it was interesting to inves- tigate the lowest potential at which the coverage of the copper surface by TU could be detected. For this purpose, voltammograms of thallium upd covering the potential range where the alloyi were run ing effect is negligible [32—35]. The blank voltammograms (Fig. 6) show the anodic and cathodic peaks of thal jum upd in the potential range — 0.65 to — 0.45 V. The anodic to cathodic charge ratio is Q,/OQ,=1, and involves a charge density of 0.35 mC cm~? a reported [34]. he process as has been