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Fig 3. Effect of ww MIDB time and temperature I on HEBR 214 contrast and exposure dose. d eC Fig 4. Effect on contrast of a 60 sec PEB at different temperatures-Olin Hunt HEBR 214

Figure 3 Effect of ww MIDB time and temperature I on HEBR 214 contrast and exposure dose. d eC Fig 4. Effect on contrast of a 60 sec PEB at different temperatures-Olin Hunt HEBR 214

Related Figures (4)

Fig I. Contrast curves for e-beam exposed Aspect System 912 (i-line resist), developed by various methods. REFERENCES
Fig I. Contrast curves for e-beam exposed Aspect System 912 (i-line resist), developed by various methods. REFERENCES
Fig 2. Contrast curves for HPR204, HEBR 214 and 242, control vs. ww MIDB at 30°C for a total development time of 2 mins.
Fig 2. Contrast curves for HPR204, HEBR 214 and 242, control vs. ww MIDB at 30°C for a total development time of 2 mins.
Fig 5. Comparison of HEBR 214 profiles developed for 4 mins in HPRD 419 developer 0.8 Lum gap, exposure dose 24 uCicm2 a) control b) MIRD c) 35°C ww MIDB d) 35°C MIDB
Fig 5. Comparison of HEBR 214 profiles developed for 4 mins in HPRD 419 developer 0.8 Lum gap, exposure dose 24 uCicm2 a) control b) MIRD c) 35°C ww MIDB d) 35°C MIDB
Fig 7. Altered profile with HEBR 242 a) control , 18 pCilcm2 6b) 30°C MIDB treatment , 16 tkCicm2
Fig 7. Altered profile with HEBR 242 a) control , 18 pCilcm2 6b) 30°C MIDB treatment , 16 tkCicm2
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