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Fig. 8. X-ray diffractograms corresponding to the copper deposits obtained at E=—175 mV (SCE) in the absence and presence of 15 mL/L Ferasine. Experimental conditions as Fig. 7. It is also noteworthy to mention that in the investigated experimental conditions the copper depos-

Figure 8 X-ray diffractograms corresponding to the copper deposits obtained at E=—175 mV (SCE) in the absence and presence of 15 mL/L Ferasine. Experimental conditions as Fig. 7. It is also noteworthy to mention that in the investigated experimental conditions the copper depos-

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Fig. 1. Cyclic voltammograms for copper electrodeposition in the absence and presence of Ferasine. Experimental conditions: scan rate, 20 mV/s; open circuit potential E(j9)=0.026 V vs. SCE without Ferasine; E(j-o=—0.017 V vs. SCE with 3 mL L! Ferasine. The cyclic voltammograms recorded for copper electrodeposition in the absence and in the presence of different concentrations of Ferasine are depicted in Fig. 1. In the presence of Ferasine, the cathodic peak potential corresponding to Cu" reduction is slightly shifted towards more negative values. The slope of the increasing cathodic current can be connected with the density of crystallites (Bimaghra and Crousier, 1989) and is higher in the presence of Ferasine than in its absence. Moreover, a slight decrease of the cathodic peak area takes place, pointing out to an inhibition of the electrocrystalli- zation process. As expected, the effect is more pronounced at higher Ferasine concentrations.
Fig. 1. Cyclic voltammograms for copper electrodeposition in the absence and presence of Ferasine. Experimental conditions: scan rate, 20 mV/s; open circuit potential E(j9)=0.026 V vs. SCE without Ferasine; E(j-o=—0.017 V vs. SCE with 3 mL L! Ferasine. The cyclic voltammograms recorded for copper electrodeposition in the absence and in the presence of different concentrations of Ferasine are depicted in Fig. 1. In the presence of Ferasine, the cathodic peak potential corresponding to Cu" reduction is slightly shifted towards more negative values. The slope of the increasing cathodic current can be connected with the density of crystallites (Bimaghra and Crousier, 1989) and is higher in the presence of Ferasine than in its absence. Moreover, a slight decrease of the cathodic peak area takes place, pointing out to an inhibition of the electrocrystalli- zation process. As expected, the effect is more pronounced at higher Ferasine concentrations.
Fig. 2. Influence of Ferasine on the hydrodynamic voltammograms at RDE. Experimental conditions: scan rate, 20 mV/s; rotation speed, 1000 rpm. Curves corrected for ohmic drop.
Fig. 2. Influence of Ferasine on the hydrodynamic voltammograms at RDE. Experimental conditions: scan rate, 20 mV/s; rotation speed, 1000 rpm. Curves corrected for ohmic drop.
* Standard deviation. Kinetic parameters for copper electrodeposition from acidic sulfate solutions with and without Ferasine Table 1
* Standard deviation. Kinetic parameters for copper electrodeposition from acidic sulfate solutions with and without Ferasine Table 1
Fig. 3. Tafel plots for copper electrodeposition from acidic sulfate electrolytes containing various Ferasine concentrations (mL/L).
Fig. 3. Tafel plots for copper electrodeposition from acidic sulfate electrolytes containing various Ferasine concentrations (mL/L).
Diffusion coefficient of Cu** in acidic sulfate solutions with and without Ferasine “ Standard deviation.
Diffusion coefficient of Cu** in acidic sulfate solutions with and without Ferasine “ Standard deviation.
Fig. 5. Complex-plane impedance diagrams for copper electrodeposition. Experimental conditions: E=—0.175 V (SCE); rotation speed, 1000 rpm; Ferasine concentrations (mL/L): 0 (A), 8 (B), 15 (C). with the results obtained by cyclic voltammetry and hydrodynamic voltammetry at RDE measurements. decrease of the activation coefficients of the electro- chemical charge transfer step involved in copper electrodeposition mechanism in the presence of Ferasine. Moreover, the results are in accordance with the decrease of the «, values determined by Tafel method (Table 1) and support the view that Ferasine slightly changes the reaction pathway of the copper discharge process.
Fig. 5. Complex-plane impedance diagrams for copper electrodeposition. Experimental conditions: E=—0.175 V (SCE); rotation speed, 1000 rpm; Ferasine concentrations (mL/L): 0 (A), 8 (B), 15 (C). with the results obtained by cyclic voltammetry and hydrodynamic voltammetry at RDE measurements. decrease of the activation coefficients of the electro- chemical charge transfer step involved in copper electrodeposition mechanism in the presence of Ferasine. Moreover, the results are in accordance with the decrease of the «, values determined by Tafel method (Table 1) and support the view that Ferasine slightly changes the reaction pathway of the copper discharge process.
Influence of the rotation speed on the characteristics of the intermediate-frequency capacitive loops obtained in the presence of 15 mL/L Ferasine
Influence of the rotation speed on the characteristics of the intermediate-frequency capacitive loops obtained in the presence of 15 mL/L Ferasine
Fig. 6. Influence of Ferasine concentration and dc electrode potential on (A) charge transfer resistance, (B) iRg product, (C) double layer capacity.
Fig. 6. Influence of Ferasine concentration and dc electrode potential on (A) charge transfer resistance, (B) iRg product, (C) double layer capacity.
Fig. 7. SEM micrographs of copper deposits obtained at E=—0.175 V (SCE) in the absence and presence of Ferasine. (A) 0 mL/L, (B) 3 mL/L, (C) 15 mL/L. Experimental conditions: rotation speed, 1000 rpm; electrolysis time, 45 min.
Fig. 7. SEM micrographs of copper deposits obtained at E=—0.175 V (SCE) in the absence and presence of Ferasine. (A) 0 mL/L, (B) 3 mL/L, (C) 15 mL/L. Experimental conditions: rotation speed, 1000 rpm; electrolysis time, 45 min.
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Electrochemical Impedance SpectroscopyRotating Disc Electrode
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