2017 8th Annual Industrial Automation and Electromechanical Engineering Conference (IEMECON)
Scaling of Metal Oxide Semiconductor (MOS) devices under submicron range experiences high device ... more Scaling of Metal Oxide Semiconductor (MOS) devices under submicron range experiences high device power dissipation due to large leakage current caused by Short Channel Effects (SCE). The use of high-K dielectric gate stack in MOS technology can solve these problems. The structure of the MOS device appears to be a vital issue below 22nm technology. The technologist devised FinFET, Tunnel FET (TFET), Carbon Nano Tube based TFET (T-CNFET), Nanowire-FET (NWFET) to remove the drawbacks of the existing technology. The various features of such devices have been discussed in this article.
Microwave Heating Study of Dielectric Material Placed at the Injection Port of an E-Plane Bend
2019 3rd International Conference on Electronics, Materials Engineering & Nano-Technology (IEMENTech)
Microwave heating of dielectric window material placed at the injection port of an E-Plane Bend i... more Microwave heating of dielectric window material placed at the injection port of an E-Plane Bend is investigated in this study. 2.45 GHz microwave power is injected into a matched load through a microwave injection hardware consisting of one WR340 rectangular waveguide section and an E-plane waveguide bend. A 3-stub tuning arrangement is used to obtain a matched condition. Teflon is considered here as the dielectric window material, placed between WR340 waveguide section and E-plane bend. This study is essentially needed to know peak temperature of the dielectric material (Teflon) at various microwave power of 500W, 750W and 1kW. The objective of the work is to investigate the temperature rise in Teflon along with microwave injection hardware over predetermined time periods. The steady-state temperature analysis has also been carried out to stimulate the knowledge about the temperature variation in Teflon window, affecting loss tangent, at aforementioned power levels.
Microstructural Analysis of Copper Foil Etched and Annealed in ECR Plasma Reactor
Materials Science Forum, 2022
Microstructural analysis of commercially available cold-rolled polycrystalline copper foil, etche... more Microstructural analysis of commercially available cold-rolled polycrystalline copper foil, etched and annealed in an in-house developed Electron Cyclotron Resonance (ECR) Plasma Enhanced Chemical Vapour Deposition (PE-CVD) reactor, have been carried out using x-ray diffraction (XRD) studies. The annealing experiments were carried out under a vacuum environment, keeping the working pressure of the reactor at 50×10-3 mbar, for three different time spans of 30 mins, 45 mins and 1 hour at 823 K (550 °C) and 923 K (650 °C) respectively in presence of hydrogen plasma. The XRD studies reveal the significance of annealing time at two different temperatures for the determination of physical and microstructural parameters such as the average grain size and micro-strain in copper lattice by Williamson-Hall (W-H) method.
Studies on Copper Nanometric-Film Deposited by an In-House Developed DC Magnetron Sputtering System
Materials Science Forum, 2022
Copper nanofilms are extensively used in the field of material science research. Nanoparticles an... more Copper nanofilms are extensively used in the field of material science research. Nanoparticles and nanostructures of copper have various utilities in the field of photocatalytic and sensor applications. The transition metal nanoparticles and nanostructures supply plenty free electrons which drastically enhances the optical and electrical properties compared to bulk material. Here, copper thin films have been deposited on glass slides and silicon substrates using an indigenously developed DC magnetron sputtering system. These depositions have been carried out at three different time spans keeping the magnetron discharge current, working vacuum and target to substrate distance unaltered. The objective of this work is to study the crystalline structure and measure the thickness of the copper nanofilm deposited at three different times. The synthesized films were characterized by using X-Ray Fluorescence (XRF), X-Ray Diffractometer (XRD) and Secondary Ion Mass Spectrometer (SIMS). Chara...
Copper deposition has been carried out at various time span on glass slide and silicon substrate ... more Copper deposition has been carried out at various time span on glass slide and silicon substrate by using indigenously developed unbalanced type DC magnetron sputtering system. The main objective of this work is to study the crystalline structure of the deposited materials and also to calculate the crystallite grain size. As a transition metal, Copper nanoparticles and structures have several utilities in the field of photocatalytic and sensor applications. Such structures are utilized to provide free electrons that enhance optical and electrical properties of the photocatalytic sensor materials. These nano-catalysts enhance deposition rate and nucleation of graphitic Carbon Nitride − a popular photocatalyst. In this work, synthesized Copper thin film has been characterized by using X-Ray Fluorescence (XRF) and X-Ray Diffractometer (XRD).
Comparative Study of Sextupole and Quadrupole Magnetic Field in an ECR-PE Sputtering System
2019 3rd International Conference on Electronics, Materials Engineering & Nano-Technology (IEMENTech), 2019
In the era of nanotechnology, VLSI industry employs various deposition methods and techniques to ... more In the era of nanotechnology, VLSI industry employs various deposition methods and techniques to develop various sensors & devices, utilized in numerous applications. The commonly used deposition methods e.g., ALD, MBE, Vacuum Evaporation, CVD, PLD, Sputtering etc. are mostly dedicated for specific sets of deposition. Some of the methods are even extremely sophisticated, expensive or lack precision. Electron Cyclotron Resonance Plasma Enhanced (ECR-PE) multipurpose nano-film deposition system is one such unique apparatus that is in-house designed & developed to deposit high quality thin films of various metals and non-metals. Both, Plasma Enhanced Chemical Vapour Deposition (PE-CVD) arrangement and Sputter deposition arrangement is designed in the same plasma reactor considering permanent magnets. Although, the PE-CVD setup is already developed and made operational using a permanent magnet return yoke structure, the fabrication of the sputtering setup is yet to be carried out for its accommodation in the system. In this study, two annular permanent magnet assembly consisting of six (sextupole) and four (quadrupole) dipole magnets have been designed and simulated to study magnetic field distribution inside reactor for the sputter deposition arrangement.
Conceptual design of a double antenna fed ECR plasma enhanced nano-film deposition system
2017 1st International Conference on Electronics, Materials Engineering and Nano-Technology (IEMENTech), 2017
An Electron Cyclotron Resonance (ECR) Plasma Enhanced Chemical Vapor Deposition (CVD) setup has b... more An Electron Cyclotron Resonance (ECR) Plasma Enhanced Chemical Vapor Deposition (CVD) setup has been proposed here to create good quality uniform nano-dimensional coating on a large number of concave substrates. Our present objective is to study the wave plasma interaction in a unique ECR plasma enhanced deposition system using COMSOL Multi-Physics Software. The surface electron density and its temperature will be presented in this study by varying the intensity of confining magnetic field. Here two identical deposition chambers are fed by two identical shaped microwave coaxial antennas. In the proposed scheme, high density plasma is generated around the 875 Gauss resonance zone. It is essential for cracking the precursor gas molecules used for the deposition of the film. The study will help us to create nano-dimensional coating of dielectric materials needed for nano devices. This also will facilitate to create a uniform metallic and non-metallic nano films inside the surface of a semi-cylindrical/concave shaped device.
Study of Magnetic Field Distribution in an Indigenous DC Magnetron Sputtering Setup
2021 5th International Conference on Electronics, Materials Engineering & Nano-Technology (IEMENTech), 2021
Magnetron sputtering is a very useful technique for various metallic and non-metallic thin film d... more Magnetron sputtering is a very useful technique for various metallic and non-metallic thin film development. Due to its uniform deposition and high deposition rate, researchers found an interest in this deposition technique. The magnetic field distribution is the main key factor in magnetron sputtering deposition. In this work, a simulation study of magnetic field distribution of an indigenously designed and developed DC magnetron sputter-head has been carried out using Magneto-static solver program in CST Studio software. The obtained field variation plot along the diameter from simulation study has been compared with the physical magnetic field mapping experiment.
Design study of a portable permanent magnet ECR plasma source for thin film deposition
2017 1st International Conference on Electronics, Materials Engineering and Nano-Technology (IEMENTech), 2017
Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition (ECR-PECVD) is one of the ... more Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition (ECR-PECVD) is one of the most popular deposition technique used today to develop precision lower nano-dimensional films. High temperature is not usually required for synthesis of thin films in PECVD technique. The designs of the magnetic field and microwave injection system have been studied using COMSOL multi-physics and the results are presented here. The propagation of 2.45 GHz microwave power through its injection hard-wares have been studied precisely. A 700W, 2.45 GHz magnetron source is feeding microwave to the 150mm diameter cylindrical plasma cum deposition chamber through a coaxial antenna. A mode conversion takes place from coaxial to rectangular injection line. A mirror magnetic field configuration has been achieved with the help of two annular portable rare earth toroidal ring magnets of remnant magnetism 1.15 T. The magnetization direction has been considered along the length of the magnet. Particle wave interaction takes place in the plasma chamber and the produced plasma propagates into the deposition chamber to react with the precursor resulting energetic radicals. Radicals thus produced deposits on the substrate to create desired nano-dimensional films.
A novel route for the synthesis of large area graphene by an indigenously built electron cyclotro... more A novel route for the synthesis of large area graphene by an indigenously built electron cyclotron resonance (ECR) plasma enhanced chemical vapor deposition (PECVD) setup has been reported in this work. A unique 2.45 GHz permanent magnet type ECR PECVD system has been designed and developed for the growth of various nano-structures and films. The apparatus has a unique advantage to synthesize large area graphene at much lower additional substrate heating than heat supplied by an external oven in conventional thermal CVD method. A major amount of heat is supplied here by ECR plasma. Polycrystalline copper foil is used here as a catalytic substrate which is pre annealed inside resonant hydrogen plasma prior to its exposure under precursor gaseous plasma inside the ECR PECVD reactor. Methane is used as carbon precursor along with hydrogen as carrier gas. Argon gas is used for the rapid cooling of the substrate maintaining suitable thermodynamic condition favorable for graphene synthesi...
In recent years, conjugated polymers such as graphitic Carbon Nitride (g-C3N4) attracts major att... more In recent years, conjugated polymers such as graphitic Carbon Nitride (g-C3N4) attracts major attention to the researchers for the harnessing of renewable energy and environmental remediation through photocatalytic water splitting. Its moderate electronic band gap structure helps to absorb large spectrum of abundant solar radiation for the generation of hydrogen, a high density chemical energy source, by water splitting method. Its outstanding physicochemical stability makes it a reliable energy conversion material. Another key attribute to the researchers is the simple way of synthesizing pristine g-C3N4 and its nanocomposite structures modified with metallic and non-metallic materials. g-C3N4 can be synthesized in both chemical and physical process. In this work, the superiority in structural, optical and photocatalytic property observed in physically developed g-C3N4 over chemically synthesized g-C3N4 has been discussed and based on such studies, a suitable synthesis method has b...
Elemental Composition Analysis of DC Magnetron Sputter Deposited Various Cu Thin Films
2021 5th International Conference on Electronics, Materials Engineering & Nano-Technology (IEMENTech), 2021
In this study, various copper thin films are deposited using in-house DC magnetron sputtering sys... more In this study, various copper thin films are deposited using in-house DC magnetron sputtering system at different deposition conditions. The elemental composition of the deposited thin films is investigated by using X-ray Photoelectron Spectroscopy (XPS). The total survey scan and the high-resolution scan at Cu 2p positions are studied thoroughly to optimize the deposition parameter for obtaining better copper content. It is observed that prominent peaks of Cu 2p3/2 and Cu 2p1/2 are obtained from the high-resolution scan of Cu 2p in this developed thin film and these peaks are separated around ~ 19 e V which implies the formation of various oxides.
Importance of transition metal modified graphene-based non-enzymatic blood glucose sensors
2020 4th International Conference on Electronics, Materials Engineering & Nano-Technology (IEMENTech), 2020
Prevalence of diabetes mellitus is a growing area of concern worldwide. An accurate and timely de... more Prevalence of diabetes mellitus is a growing area of concern worldwide. An accurate and timely detection can lead to a normal life of a patient. The existing enzyme-based method for blood glucose detection suffers from poor sensitivity and interference with other blood constituents. Hence, the nano-material synthesis for sensitive and stable non-enzyme based sensors for blood glucose measurement is a worldwide frontline emerging area of research. In this study, the significance of transition metal nano-particle decorated graphene film as a non-enzymatic sensor is discussed. A scheme for synthesizing this sensor materials with detection mechanism is also proposed. The Biomedical and Bioprocess Engineering will be immensely benefitted by the outcome of such research on non-enzymatic glucose sensor material.
Bandgap Study of Defect Induced Graphene Structures
2021 5th International Conference on Electronics, Materials Engineering & Nano-Technology (IEMENTech), 2021
Graphene is considered as one of the most significant 2-D materials. However, the zero-bandgap pr... more Graphene is considered as one of the most significant 2-D materials. However, the zero-bandgap property of pristine graphene restricts its use as semi-conductor material. Hence, introducing defect in the graphene structure can produce an appreciable band-gap that can be utilized in semiconducting industry. In this work, band-structure and density of states (DOS) of graphene and its various defect induced structures are studied by employing density functional theory (DFT) method using the BURAI GUI of Quantum ESPRESSO.
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Papers by Soumik Kundu